Canon has lately revealed its FPA-1200NZ2C, a nanoimprint semiconductor manufacturing device that can be utilized to make superior chips. The system makes use of nanoimprint lithography (NIL) know-how as a substitute for photolithography, and might theoretically problem excessive ultraviolet (EUV) and deep ultraviolet (DUV) lithography instruments on the subject of decision.
Not like conventional DUV and EUV photolithography tools that transfers a circuit sample onto a resist-coated wafer by way of projection, nanoimprint device employs a distinct approach. It makes use of a masks, embossed with the circuit sample, which immediately presses towards the resist on the wafer. This methodology eliminates the necessity for an optical mechanism within the sample switch course of, which guarantees a extra correct copy of intricate circuit patterns from the masks to the wafer. In concept, NIL permits formation of advanced two- or three-dimensional circuit patterns in a single step, which guarantees to decrease prices. NIL itself just isn’t a brand new know-how, but it surely has remained in parallel growth through the years, whereas the challenges concerned in additional enhancing photolithography have Canon believing that now is an effective time for a second-look.
Canon says that its FPA-1200NZ2C permits patterning with a minimal linewidth (vital dimensions, CD) of 14 nm, which is nice sufficient to ‘stamp’ a circa 26-nm minimal steel pitch, and subsequently appropriate for five nm-class course of applied sciences. That will be consistent with capabilities of ASML’s Twinscan NXE:3400C (and related) EUV lithography scanners with a 0.33 numerical aperture (NA) optics.
In the meantime, Canon says that additional refinements of its know-how, its device can obtain finer resolutions that may allow 3 nm and even 2 nm-class manufacturing nodes.
Nanoimprint lithography gives a number of compelling benefits over photolithography. Primarily, NIL excels in decision, enabling the creation of buildings on the nanometer scale with exceptional precision with out utilizing photomasks. This know-how bypasses the diffraction limits encountered in typical photolithography, permitting for extra intricate and smaller options. Moreover, NIL operates with out the need of advanced optics or high-energy radiation sources, resulting in probably decrease operational prices and easier tools.
One other benefit of NIL is its direct patterning functionality, enabling the copy of three-dimensional nanostructures successfully. Such performance makes NIL a potent device within the manufacturing of photonics and different functions the place three-dimensional nano-patterns are important. The know-how additionally facilitates higher sample constancy and uniformity.
Nevertheless, NIL additionally presents sure challenges and limitations. One notable situation is its susceptibility to defects because of the direct contact concerned within the imprinting course of. Particles or contaminants current on the substrate or the mould can result in defects, which can have an effect on the general yield and reliability of the manufacturing course of. This necessitates impeccable course of management and cleanliness to take care of constant output high quality.
Moreover, NIL, in its conventional type, is a serial course of, which limits its throughput and manufacturing capability. Not like photolithography, which may course of whole wafers or giant areas in a parallel style, NIL usually entails processing smaller areas sequentially. This poses nice challenges in scaling the know-how for high-volume manufacturing of chips, which limits its utilization for chip manufacturing. In the meantime, NIL can be utilized to create photomasks for EUV and DUV. Additionally, it will probably theoretically be used to create patterned media for arduous disk drives.
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